Plasma deposited carbon containing zirconia films as thermal barriers

Carbon containing zirconia films are deposited from chemical vapor deposition (CVD) and plasma enhanced (PECVD), as being used thermal barrier coatings for many applications. Their conductivity has been measured temperatures ranging room temperature up to 450 K using the 3 ω method. It is shown that samples exhibit a lattice an electronic contribution reaching values 13 W/m/K CVD 5 PECVD at K. At temperature, conductivities in range of 1 W/m/K, whereas film shows 8 W/m/K. The large differences explained by microstructure films, showing smaller grain sizes with poor interfaces compared denser films. This carbon may serve excellent barriers.